Leading European semiconductor research institute imec has officially inaugurated the NanoIC pilot line at its Leuven headquarters. This facility marks a significant step for Europe in advanced semiconductor manufacturing, aiming to bridge the gap between lab research and commercial production for technologies beyond 2nm.

The project represents a massive €2.5 billion investment, funded through a collaboration between the EU, Belgian governments, and industry partners including ASML. A cornerstone of the facility is the installation of ASML's High NA EUV lithography tool, which is critical for developing next-generation chip processes.

The NanoIC line is designed to accelerate innovation in fields like AI, autonomous driving, and quantum computing. It has already released early process design kits (PDKs) for advanced nodes, laying the groundwork for future R&D and commercialization.

ICgoodFind: The launch of the NanoIC pilot line underscores Europe's strategic push to reclaim leadership in cutting-edge semiconductor manufacturing, intensifying global competition and accelerating the pace of technological advancement.